PBN-PG-PBN pumehana huikau
1. Maʻemaʻe kiʻekiʻe (>99.999%)
2. Kemika inertness
3 Haʻahaʻa haʻahaʻa outgassing rate
4.Low hoʻonui wela i ka wela kiʻekiʻe
5. ʻO ke kūlike o ka wela kiʻekiʻe
6.E piʻi koke a hāʻule i ka mahana.
Hiki ke hoʻopilikino ʻia ka 7shape.
8. ʻO ka mahana hana kiʻekiʻe loa hiki ke hiki i 1600 ° C
• CIGS effusion cell
• OLED effusion cell
• Sputter uhi, substrate wela ma CVD kahua
• Electron microscope specimen hoʻomehana
• Nozzle heater no ka hoʻomehana kinoea
| Kinohi | Nui | Palekana Uila (Q)(Ω) | mana(W) | Kaulike mahana | Kiʻekiʻe (mm) |
| Disk | 1'' | 10-16 | 300 | ＜1% | 600 ka nui |
| 2'' | 15-25 | 1200 | ＜1% | ||
| 3'' | 22-35 | 3000 | ＜1% | ||
| 4'' | 22-35 | 3600 | ＜1% | ||
| Pohaku | 1'' | 10-16 | 300 | <1.5% | ʻO 800 ka nui |
| 2'' | 15-25 | 1200 | <1.5% | ||
| 3'' | 22-35 | 3000 | <1.5% | ||
| 4'' | 22-35 | 3600 | <1.5% |
1. Pono ka hui ponoʻī e kākoʻo i kāu kūʻai.
Loaʻa iā mākou kahi hui R&D maikaʻi loa, kahi pūʻulu mana koʻikoʻi koʻikoʻi, kahi hui ʻenehana maikaʻi loa a me kahi hui kūʻai maikaʻi e hoʻolako i kā mākou mea kūʻai aku i ka lawelawe a me nā huahana maikaʻi loa.ʻO mākou nā mea hana a me nā hui kālepa.
2. Loaʻa iā mākou kā mākou hale hana ponoʻī, e hana ana i kahi ʻōnaehana hana ʻoihana mai ka lako lako,hana i nā kūʻai aku, a me kahi hui R&D a me QC.Mālama mau mākou i ke ʻano o ka mākeke.Mākaukau mau mākou e hoʻolauna i nā ʻenehana a me nā lawelawe hou e hoʻokō i ka noi mākeke.
3. Hōʻoia maikaʻi.
Hoʻopili mākou i ka mea nui i ka maikaʻi.ʻO ka hana ʻana o kā mākou huahana e hoʻokō i nā kūlana hoʻokele maikaʻi ISO 9001/14001/45001.
ʻOiaʻiʻo inā makemake kekahi o kēia mau mea iā ʻoe, e ʻoluʻolu e haʻi mai iā mākou.E hauʻoli mākou e hāʻawi iā ʻoe i kahi ʻōlelo ma ka loaʻa ʻana o nā kikoʻī kikoʻī o kekahi.Loaʻa iā mākou kā mākou loea R&D loea e hoʻokō i kekahi o nā koi.Welina mai e nānā i kā mākou hui.